High Vacuum Deposition System

HV chamber (base pressure: 10-8 Torr) for growth of metal, semiconductive and dielectric thin films & coatings  on 5'' substrates by RF & DC magnetron sputtering for protective and optical / plasmonic applications. Equipped with load-lock and process monitoring techniques (vis-UV Spectroscopic Ellipsometry and Lagmuire Probe).

DC Magnetron Sputtering

RF Magnetron Sputtering

Reactive Magnetron Sputtering

hv pvd