Lab for Thin Films - Nanobiomaterials - Nanosystems - Nanometrology

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Chemical Vapor Deposition Pilot Line

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Recently installed (2015) and fully operational Thermal and Plasma Chemical Vapor Deposition (CVD) pilot line for Graphene, 2D Nanomaterials, Carbon Nanotubes and Semiconducting nanowires growth on 6" wafer for cutting edge research and applications in nanoelectronics and photonics.

Equipped with vis-UV Spectroscopic Ellipsometer and Raman for real-time process control of the thickness (e.g. single (SL) or multilayer (ML) graphene growth and thickness uniformity), the surface chemistry and the quality of graphene, respectively. 

Achievements: Uniform growth of graphene on 6" wafer, process control for the growth on SL and ML graphene.

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