Lab for Thin Films - Nanobiomaterials - Nanosystems - Nanometrology

inside3

cvd 01

Recently installed (2015) and fully operational Thermal and Plasma Chemical Vapor Deposition (CVD) pilot line for Graphene, 2D Nanomaterials, Carbon Nanotubes and Semiconducting nanowires growth on 6" wafer for cutting edge research and applications in nanoelectronics and photonics.

Equipped with vis-UV Spectroscopic Ellipsometer and Raman for real-time process control of the thickness (e.g. single (SL) or multilayer (ML) graphene growth and thickness uniformity), the surface chemistry and the quality of graphene, respectively. 

Achievements: Uniform growth of graphene on 6" wafer, process control for the growth on SL and ML graphene.

uhv dca 01 uhv dca 02 uhv dca 04

UHV chambers (base pressure: 10-10 Torr) for organic (small molecule) semiconductors for application in organic electronics and inorganic (metals, oxides, nitrides, borides) conductive and semiconductive thin films for applications in Organic Electronics, Semiconductors and Optical Coatings Industry. Growth on 4'' substrates. Equiped with various PVD growth techniques (sputtering, ion-beam assisted deposition, e-beam evaporation, etc.) and in-situ process monitoring and optical characterization techniques (MWSE, FTIRSE, QMS).

Recent Achievements: Bulk heterojunction small molecules (ZnPc:C60 etc) solar cells, growth of ultra high barrier multilayers for the packaging of flexible organic electronic devices,  ZnO based transparent conductive oxides on flexible plastic substrates

E-Beam Evaporation & Thermal Evaporation

DC Sputtering

Pulsed DC Sputtering

In-line Optical Characterization (VIS-UV, FTIR Ellipsometry)

uhv dca 03

HV Chamber (base pressure: 10-7 Torr) for protective and multifunctional thin films & coatings growth on to 2D and 3D substrates with High-power Impulse Magnetron Sputtering (HIPIMS) and Closed Field Unbalanced Magnetron Sputtering (CFUBMS). Process monitoring via in-situ Multi-Wavelength Spectroscopic Ellipsometry, Optical Emission Spectroscopy and Lagmuire Probe Plasma Diagnostics.

Closed Field DC Unbalanced Magnetron Sputtering

High-power Impulse Magnetron Sputtering

Recent Achievements: Growth of ultra hard protective coatings (Hardness > 50 GPa)

hv3d teer 

HV chamber (base pressure: 10-8 Torr) for growth of metal, semiconductive and dielectric thin films & coatings  on 5'' substrates by RF & DC magnetron sputtering for protective and optical / plasmonic applications. Equipped with load-lock and process monitoring techniques (vis-UV Spectroscopic Ellipsometry and Lagmuire Probe).

DC Magnetron Sputtering

RF Magnetron Sputtering

Reactive Magnetron Sputtering

hv pvd

Nanoindenter for quasistatic and dynamic nanoindentation testing. Hardness and the Elastic Modulus measurements versus the penetration deoth and study of the deformation modes of bulk materials, nanocomposite materials, hard protective coatings and thin films, barrier coating for flexible electronics packaging, soft materials (polymers and organic layers) fibrous scaffolds, nanocomposite concrete.

Nano-scratch tester (i.e. adhesion, friction coefficient and elastic/plastic deformation of films and coatings).

Equipped with diamond tips in various shapes (Berkovich type, cono-spherical, cube corner, line load).

 

indent

Scanning Probe Microscope (SPM) platforms for surface and nano-mechanical characterization of nanomaterials (thin films, polymers, nanoparticles ect) and nanosystems. The SPM platform supports:

- Atomic Force Microscope scanning in Contact, Tapping and non-Contact modes,
- Scanning Tunneling Microscopy
- Atomic Force Acoustic Microscopy (Surface mechanical properties),
- Scanning in Liquid head and nitrogen environment
- Heating Stage (up to 300 ºC).

spm

Nanoeducator Platfrom created to organize the training scientific laboratories for nanotechnology teaching and develop some skills in SPM investigations, nanomanipulations and nanolithography.  educat
Copyright © 2016-2017 LTFN. All Rights Reserved.